---
title: "EBeam Lithographer"
ocid: "ocds-h6vhtk-065fc1"
canonical_url: "https://d3tenders.com/contract/?ocid=ocds-h6vhtk-065fc1"
markdown_url: "https://d3tenders.com/contract/ocds-h6vhtk-065fc1.md"
json_url: "https://d3tenders.com/contract/ocds-h6vhtk-065fc1.json"
source: "Find A Tender Service"
current_stage: "Award"
buyer: "UNIVERSITY OF EDINBURGH"
published: "2026-03-02"
---

# EBeam Lithographer

Buyer: UNIVERSITY OF EDINBURGH  
Current stage: Award  
OCID: ocds-h6vhtk-065fc1

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## Summary

The University Of Edinburgh has completed the procurement process for an Electron Beam Lithography System titled 'EBeam Lithographer'. The procurement falls under the industry category of laboratory, optical, and precision equipment, requiring advanced technology specifications. The procurement stage is marked complete, with a contract awarded on 19th February 2026. The goods are to be delivered to Edinburgh, Scotland (region UKM75), and are part of a limited procurement method conducted without prior publication due to technical reasons, with JEOL (UK) Ltd identified as the sole supplier capable of fulfilling this requirement. The contract is valued at £2,398,869 GBP.

This tender presents a unique opportunity for businesses specialising in high-tech equipment manufacturing, particularly in the field of electron beam technology. Although competition was limited for technical reasons, companies with the capability to develop or supply similar high precision technical equipment could benefit from understanding the specifications required by such institutions. Engaging with universities in research and development activities provides potential for innovation partnerships, product development, and expanding into niche markets within scientific sectors. Despite only one bid being received, businesses that can meet or replicate these specific technical requirements may enhance their credibility and market presence in this specialised equipment sector.

## Notice

The University has a requirement for an Electron Beam lithography system which has an acceleration voltage of at least 200 kV. It must be capable of the following: a) Ultra-fine line lithography: 3 nm linewidth, using commercially available resists. This can be obtained by its single-nm digit beam diameter. b) Ultra-high position accuracy: This can be obtained by a laser interferometer with A (sub-1 nm) reading resolution, enabling a stitching accuracy of +-8 nm and overlay accuracy of +-8 nm. c) Uniform fine pattern writing over entire field: Uniform nm-scale lines can be drawn from edge to edge across a large field (>=2000mm) without the need for stitching. This guarantees better accuracy, eliminates the need for stage movement, and enhances writing speed and throughput. d) High throughput lithography: This will be enabled by a 125 MHz (or higher) high-speed deflection system coupled with a new electron beam column design. e) Wafer scale (& multi wafer) processing: Single cassette auto-loader supporting 8-inch wafers with a multi-cassette automatic sample loading system. Fast loading and pumping time. f) Flexibility in sample holders: Offer the ability to simultaneously handle a variety of wafer sizes by incorporating distinct holders for processing full wafers (2-8 inches) and/or small. g) Software: SEM Imaging Software, Alignment Software and CAD designing Software, which allows using and/or converting into industry standard GDSII and DXF file formats. It is believed the JEOL JBX-8100FS G3 Electron Beam Lithography System is the sole machine which complies with these requirements. Therefore, we deem competition is absent for technical reasons.

### Lot Information

Lot 1

The University has a requirement for an Electron Beam lithography system which has an acceleration voltage of at least 200 kV. It must be capable of the following: a) Ultra-fine line lithography: 3 nm linewidth, using commercially available resists. This can be obtained by its single-nm digit beam diameter. b) Ultra-high position accuracy: This can be obtained by a laser interferometer with A (sub-1 nm) reading resolution, enabling a stitching accuracy of +-8 nm and overlay accuracy of +-8 nm. c) Uniform fine pattern writing over entire field: Uniform nm-scale lines can be drawn from edge to edge across a large field (>=2000mm) without the need for stitching. This guarantees better accuracy, eliminates the need for stage movement, and enhances writing speed and throughput. d) High throughput lithography: This will be enabled by a 125 MHz (or higher) high-speed deflection system coupled with a new electron beam column design. e) Wafer scale (& multi wafer) processing: Single cassette auto-loader supporting 8-inch wafers with a multi-cassette automatic sample loading system. Fast loading and pumping time. f) Flexibility in sample holders: Offer the ability to simultaneously handle a variety of wafer sizes by incorporating distinct holders for processing full wafers (2-8 inches) and/or small. g) Software: SEM Imaging Software, Alignment Software and CAD designing Software, which allows using and/or converting into industry standard GDSII and DXF file formats. It is believed the JEOL JBX-8100FS G3 Electron Beam Lithography System is the sole machine which complies with these requirements. Therefore, we deem competition is absent for technical reasons.

Options: For transparency, extensions to service arrangements, and spare parts, may be purchased from the awarded supplier.

### Procurement Information

The University has a requirement for an Electron Beam lithography system which has an acceleration voltage of at least 200 kV. It must be capable of the following:

## Key Details

| Field | Value |
| --- | --- |
| Publication source | Find A Tender Service |
| Latest notice | https://www.find-tender.service.gov.uk/Notice/018498-2026 |
| Notice type | Award Notice |
| Procurement type | Standard |
| Procurement category | Goods |
| Procurement method | Limited |
| Procurement method details | Award procedure without prior publication of a call for competition |
| Tender suitability | Not specified |
| Awardee scale | Large |
| All stages | Award |

## Dates

| Field | Value |
| --- | --- |
| Publication date | 2 Mar 2026 |
| Submission deadline | Not specified |
| Future notice date | Not specified |
| Award date | 19 Feb 2026 |
| Contract period | Not specified |
| Recurrence | Not specified |

## Values

| Field | Value |
| --- | --- |
| Tender value | Not specified |
| Lots value | Not specified |
| Awards value | Not specified |
| Contracts value | £2,398,869 |

## Status

| Field | Value |
| --- | --- |
| Tender status | Complete |
| Lots status | Cancelled |
| Awards status | Active |
| Contracts status | Active |

## Buyer

| Field | Value |
| --- | --- |
| Main buyer | UNIVERSITY OF EDINBURGH |
| Locality | EDINBURGH |
| Post town | Edinburgh |
| Postcode | EH1 1HT |
| Country | Scotland |
| ITL 1 | TLM Scotland |
| ITL 2 | TLM1 East Central Scotland |
| ITL 3 | TLM13 City of Edinburgh |
| Local authority | City of Edinburgh |
| Electoral ward | City Centre |
| Westminster constituency | Edinburgh East and Musselburgh |
| Delivery location | TLM75 City of Edinburgh |

## Supplier

| Field | Value |
| --- | --- |
| Number of suppliers | 1 |
| Supplier names | JEOL (UK |

## CPV Codes

### Divisions

- 38 - Laboratory, optical and precision equipments (excl. glasses)

### Codes

- 38000000 - Laboratory, optical and precision equipments (excl. glasses)

## Release History

- 2 Mar 2026 at 14:18 - Award - Award Notice - https://www.find-tender.service.gov.uk/Notice/018498-2026

## Notice URLs

- http://www.ed.ac.uk
- https://api.publiccontractsscotland.gov.uk/v1/Notice?id=ocds-r6ebe6-0000825231
- https://www.publiccontractsscotland.gov.uk/search/Search_AuthProfile.aspx?ID=AA00107

## Provenance

This Markdown file is an alternate public rendering of the D3 Tenders contract record. The canonical page is https://d3tenders.com/contract/?ocid=ocds-h6vhtk-065fc1. The underlying structured data is available as OCDS JSON at https://d3tenders.com/contract/ocds-h6vhtk-065fc1.json.