Award

Supply and Commissioning of a Magnetron Sputter Deposition Tool

UNIVERSITY OF STRATHCLYDE

This public procurement record has 2 releases in its history.

Summary of the contracting process

The procurement process led by the University of Strathclyde focuses on the acquisition of a Magnetron Sputter Deposition Tool. This procurement falls under the goods category, specifically aimed at enhancing research capabilities in educational institutions. The process, designated with the ID UOS-35191-2024, was conducted using an open procurement method. Key stages included tender initiation on 3rd March 2025, with an award date set for 18th March 2025. The awarded contract was finalised with HHV Ltd, a small to medium-sized enterprise, with the contract signed on 15th August 2025. The project is based in Glasgow, Scotland, and specifically targets equipment for micro-fabrication within a cleanroom setting. The total contract value amounts to £60,000, marking the completion of this procurement stage.

This tender presents considerable growth opportunities for businesses, especially those in the field of advanced manufacturing and academic research supply. Companies specialising in semiconductor equipment, particularly those skilled in manufacturing sputtering systems, will find this project aligns with their offerings. The University of Strathclyde’s requirement for an argon-based magnetron sputtering system for multiple wafer sizes opens doors for businesses that can provide innovative and versatile engineering solutions tailored to research and development contexts. Additionally, this tender demonstrates a preference for suppliers capable of delivering high-reliability equipment suitable for academic settings, indicating an opportunity for businesses that possess relevant experience and a track record in this niche market.

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Notice Title

Supply and Commissioning of a Magnetron Sputter Deposition Tool

Notice Description

Argon-based magnetron sputtering system for sequential deposition of metals. The deposition should be made with a direct current method over up to 4" wafer area. The deposition should also be conformal to features present on the wafers. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility.

Lot Information

Lot 1

This procurement is for the supply and commissioning of a Magnetron Sputter Deposition Tool. The Institute of Photonics is seeking to complement their cleanroom micro-fabrication facility equipment with an argon-based magnetron sputtering system for contacting semiconductor light-emitting devices, based on Gallium Nitride (as an example), using the sequential deposition of metals onto a wafer area of up to four inches (platen size). The system is primarily destined to be employed for academic research. It is purposed to be a downgrade from existing industrial-scale legacy equipment. The current legacy equipment was inherited by the department during the closure of a university department. There have been issues with the availability of spare parts for the legacy equipment. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility. Further details of requirements are detailed in the Specification of Requirements.

Options: Description of options: The Contracting Authority reserves the right to request additional deliveries by the successful tenderer, either intended as partial replacement of supplies or installations, or as extensions of existing supplies and installations. The Contracting Authority may at its sole discretion exercise this option.

Publication & Lifecycle

Open Contracting ID
ocds-r6ebe6-0000791218
Publication Source
Public Contracts Scotland
Latest Notice
https://www.publiccontractsscotland.gov.uk/search/show/search_view.aspx?ID=SEP538252
Current Stage
Award
All Stages
Tender, Award

Procurement Classification

Notice Type
PCS Notice - Website Contract Award Notice
Procurement Type
Standard
Procurement Category
Goods
Procurement Method
Open
Procurement Method Details
Open procedure
Tender Suitability
Not specified
Awardee Scale
SME

Common Procurement Vocabulary (CPV)

CPV Divisions

38 - Laboratory, optical and precision equipments (excl. glasses)


CPV Codes

38000000 - Laboratory, optical and precision equipments (excl. glasses)

Notice Value(s)

Tender Value
£65,000 Under £100K
Lots Value
£65,000 Under £100K
Awards Value
Not specified
Contracts Value
£60,000 Under £100K

Notice Dates

Publication Date
2 Sep 20255 months ago
Submission Deadline
18 Mar 2025Expired
Future Notice Date
Not specified
Award Date
15 Aug 20256 months ago
Contract Period
Not specified - Not specified
Recurrence
Not specified

Notice Status

Tender Status
Complete
Lots Status
Complete
Awards Status
Not Specified
Contracts Status
Active

Contracting Authority (Buyer)

Main Buyer
UNIVERSITY OF STRATHCLYDE
Contact Name
Kenneth Carlin, Category Manager
Contact Email
kenneth.carlin@strath.ac.uk, kirstie.higgins@strath.ac.uk
Contact Phone
+44 7811592949

Buyer Location

Locality
GLASGOW
Postcode
G1 1XU
Post Town
Glasgow
Country
Scotland

Major Region (ITL 1)
TLM Scotland
Basic Region (ITL 2)
TLM3 West Central Scotland
Small Region (ITL 3)
TLM32 Glasgow City
Delivery Location
TLM82 Glasgow City

Local Authority
Glasgow City
Electoral Ward
Anderston/City/Yorkhill
Westminster Constituency
Glasgow North East

Supplier Information

Number of Suppliers
1
Supplier Name

HHV

Further Information

Notice Documents

  • https://www.publiccontractsscotland.gov.uk/search/show/search_view.aspx?ID=MAR524994
    Supply and Commissioning of a Magnetron Sputter Deposition Tool - Argon-based magnetron sputtering system for sequential deposition of metals. The deposition should be made with a direct current method over up to 4" wafer area. The deposition should also be conformal to features present on the wafers. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility.
  • https://www.publiccontractsscotland.gov.uk/search/show/search_view.aspx?ID=SEP538252
    Supply and Commissioning of a Magnetron Sputter Deposition Tool - Argon-based magnetron sputtering system for sequential deposition of metals. The deposition should be made with a direct current method over up to 4" wafer area. The deposition should also be conformal to features present on the wafers. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility.

Open Contracting Data Standard (OCDS)

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